NeoCoat custom HFCVD reactors have the following specifications:
Thanks to its proprietary specific nanoseeding pretreatment, NeoCoat can provide:
Substrate | p-Si, n-Si, SiC, Si3N4, refractory metals, cemented carbide, oxydes (alumina, silica) |
Substrate size | Up to 400 mm |
Substrate shape | 3D structured, patterned, flat... |
Film thickness | 100 nm to 50 µm |
Film structure | Microcrystalline or nanocrystalline |
Film roughness | Microcrystalline: 0.1µm for 3µm thick film, optional polishing to decrease down to 2nm |
Nanocrystalline: < 30nm (independent from film thickness) | |
Boron concentration | 100-10000 ppm |
Uniformity within 100 mm (3σ) | ±5 % |